- Maximum rendering area : 600*600mm
- Exposure method : Step and repeat method and scanning method
- Reflection projection exposure using DMD
- Minimum exposure line width : 3 μm
- Exposure range : 1.024 × 0.768 mm
- Light source : semiconductor laser
- Wavelength : 405nm
- Light source capacity : 10W
- Illumination on exposure side : 10 W/cm2 or more
- 三相,220V,60Hz